1. Mathematical and computational modeling for multiscale/multiphysics in smart chemical process and materials design
2. Advanced materials and process for next generation semiconductors
3. Theories and modeling for information processing
4. Self-assembly and self-organization for pattern formation
5. Nanophotonics & plasmonics
Education
B.S. in Chemical Engineering, Seoul National University (2002.2)
M.S. in Chemical Engineering, Seoul National University (2004.2)
Ph.D. in Chemical Engineering, Massachusetts Institute of Technology (MIT) (2013.6)
Experience
Research Scientist in Materials Research Division at Korea Institute of Science and Technology (KIST) (2004.1-2014.2)
Senior Research Scientist in Materials Research Division at Korea Institute of Science and Technology (KIST) (2014.3-2019.2)
Principal Research Scientist in Advanced Materials Research Division at Korea Institute of Science and Technology (KIST) (2019.3-2021.2)
Journal Articles
(2023)
Plasmon-Driven Reaction Selectivity Tuning for Photoelectrochemical H<sub>2</sub>O<sub>2</sub> Production.
ACS ENERGY LETTERS.
8,
12
(2023)
Facet-Dependent Passivation for Efficient Perovskite Solar Cells.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY.
145,
44
(2023)
Superhalogen modulation: an effective approach for minimizing light-induced halide segregation in MAPb(I0.7Br0.3)(3).
JOURNAL OF MATERIALS CHEMISTRY A.
11,
35
(2023)
Planar Spin Glass with Topologically Protected Mazes in the Liquid Crystal Targeting for Reconfigurable Micro Security Media.
ADVANCED MATERIALS.
35,
36
(2023)
Charge-Transfer Complex-Based Artificial Layers for Stable and Efficient Zn Metal Anodes.
ACS ENERGY LETTERS.
8,
6
(2023)
Intensified near-field by localizing surface plasmon for enhancing photoelectrochemical responses via periodically patterned Au assemblies.
CHEMICAL ENGINEERING JOURNAL.
461,
(2023)
Synthesis of MAPbBr(3)-Polymer Composite Films by Photolysis of DMF: Toward Transparent and Flexible Optical Physical Unclonable Functions (PUFs) with Hierarchical Multilevel Complexity.
ADVANCED MATERIALS.
35,
6
(2023)
Unveiling facet-dependent degradation and facet engineering for stable perovskite solar cells.
SCIENCE.
379,
6628
(2023)
Unveiling facet-dependent degradation and facet engineering for stable perovskite solar cells.
SCIENCE.
379,
6628
(2023)
Controlled Nitrogen Doping in Crumpled Graphene for Improved Alkali Metal‐Ion Storage under Low‐Temperature Conditions.
ADVANCED FUNCTIONAL MATERIALS.
33,
2
(2022)
Opportunities Await If China Is Shut Out of Semiconductor Innovation.
Global Asia.
17,
4
(2022)
Preparation of MAPbBr3-Polymer Composite Films by Photolysis of DMF: Towards Robust Optical Physical Unclonable Function (PUF) with Multilevel Complexity.
ADVANCED MATERIALS.
34,
48
(2022)
Controlled Nitrogen Doping in Crumpled Graphene for Improved Alkali Metal-Ion Storage under Low-Temperature Conditions.
ADVANCED FUNCTIONAL MATERIALS.
33,
2
(2022)
Controlled synthesis of solid-shelled non-spherical and faceted microbubbles.
NANOSCALE.
14,
35
(2022)
미-중 반도체 기술패권경쟁과 Chip4 동맹 그리고 한국의 대응 전략.
US-China Watching.
42,
5
(2022)
Percolated Plasmonic Superlattices of Nanospheres with 1 nm-Level Gap as High-Index Metamaterials.
ADVANCED MATERIALS.
34,
35
(2022)
Nanoscale physical unclonable function labels based on block copolymer self-assembly (vol 5, pg 433, 2022).
NATURE ELECTRONICS.
5,
8
Publications
(2022)
동아비즈니스리뷰.
동아일보사.
Solo
(2022)
미중 반도체 갈등의 군사안보적 함의.
성균중국연구소.
Solo
Patent/Intellectual Property
A method for surface planarization of an object using a light source of a specific wavelength according to an embodiment includes : providing an object in a main chamber ; injecting an etching gas into the main chamber ; inputting the light source of a specific wavelength onto a surface of the object ; and controlling a temperature of the object . According to the method , it is possible to minimize the side effects such as scratches or contamination of the sample that occur in a conventional chemical - mechanical planarization process . In addition , it is possible to allow precise planarization in nanometers ( nm ) and simultaneously perform planarization to a side surface of a device as well as a large - sized surface , thereby reducing cost and time required for the planarization process . Moreover , since the surface roughness and the electrical conductivity are improved , it is possible to increase the efficiency and output of the LED device ..
16 / 270,594 .
20210330.
UNITED STATES
